Differentiable Computational Lithogrpahy Framework
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Updated
Sep 2, 2025 - Python
Differentiable Computational Lithogrpahy Framework
Physics-accurate EUV lithography simulator — LPP Sn-plasma source, CXRO materials, multilayer TMM optics, RCWA 1D/2D mask3D, Abbe/Hopkins aerial imaging with partial coherence, resist chain (Dill ABC, PEB, development, shot noise), process window (Bossung, DoF/EL), resist calibration from wafer data. Apache-2.0, 534 tests, 6 verified notebooks.
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